Microwave treatment of photoresist on a substrate

Details Microwave treatment of photoresist on a substrate Microwave treatment of photoresist on a substrate

1993-01-12

1994-03-22

Beck, Shrive P.

Coating processes

Direct application of electrical, magnetic, wave, or...

Polymerization of coating utilizing direct application of...

427510, 427558, 427272, 427282, 427384, 430325, 430328, 430330, B05D 132

Patent

active

052962717

ABSTRACT:
Photoreactive polymers are treated by exposure to microwave energy. A film of a photoreactive polymer (12), such as a photoresist, is applied to a substrate (10) and selectively exposed to ultraviolet light. The latent image produced is further cured or polymerized by treating the photoresist with microwave energy. Combinations of microwave and thermal energies are also used. The treated photoresist is then developed, producing a sidewall (17) that is vertical, and is improved by reduction of anomolies such as scum or a foot (16) at the base of the resist.

REFERENCES:
patent: 4243744 (1981-01-01), Lockwood et al.
patent: 4459320 (1984-07-01), Fefferman
patent: 4540466 (1985-09-01), Nishizawa
patent: 4560641 (1985-12-01), Kokaku et al.
patent: 4667076 (1987-05-01), Amada
patent: 4698238 (1987-10-01), Hayasaka et al.
Brochure: E. I. Du Pont de Nemours & Co., Inc. Riston.RTM. Photopolymer Film Resist Image Transfer Systems, E-82875 (2M-Jun. 1986) entitled "Riston.RTM. Photopolymer Film 200R Series Semi-Aqueous Processable".

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