Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2010-01-06
2011-12-13
Wilczewski, Mary (Department: 2822)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S744000, C438S253000, C438S396000, C438S738000, C257SE21293, C257SE21647
Reexamination Certificate
active
08076248
ABSTRACT:
The invention includes methods for selectively etching insulative material supports relative to conductive material. The invention can include methods for selectively etching silicon nitride relative to metal nitride. The metal nitride can be in the form of containers over a semiconductor substrate, with such containers having upwardly-extending openings with lateral widths of less than or equal to about 4000 angstroms; and the silicon nitride can be in the form of a layer extending between the containers. The selective etching can comprise exposure of at least some of the silicon nitride and the containers to Cl2to remove the exposed silicon nitride, while not removing at least the majority of the metal nitride from the containers. In subsequent processing, the containers can be incorporated into capacitors.
REFERENCES:
patent: 5061650 (1991-10-01), Dennison et al.
patent: 6037218 (2000-03-01), Dennison et al.
patent: 6180450 (2001-01-01), Dennison et al.
patent: 6229169 (2001-05-01), Hofmann et al.
patent: 7067385 (2006-06-01), Manning
patent: 7125781 (2006-10-01), Manning et al.
patent: 7271051 (2007-09-01), Manning et al.
patent: 7320911 (2008-01-01), Basceri et al.
patent: 7387939 (2008-06-01), Manning
patent: 7393743 (2008-07-01), Manning
patent: 7413952 (2008-08-01), Busch et al.
patent: 7420238 (2008-09-01), Manning et al.
patent: 7439152 (2008-10-01), Manning
patent: 7449391 (2008-11-01), Manning et al.
patent: 7534694 (2009-05-01), Manning
patent: 7557013 (2009-07-01), Bhat et al.
patent: 7557015 (2009-07-01), Sandhu et al.
patent: 7666797 (2010-02-01), Shea et al.
patent: 2002/0098654 (2002-07-01), Durcan et al.
patent: 2005/0054159 (2005-03-01), Manning et al.
patent: 2008/0045034 (2008-02-01), Shea et al.
patent: 2008/0128773 (2008-06-01), Moll et al.
Graettinger Thomas M.
Shea Kevin R.
Micro)n Technology, Inc.
Wells St. John P.S.
Wilczewski Mary
LandOfFree
Methods for forming semiconductor constructions, and methods... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Methods for forming semiconductor constructions, and methods..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods for forming semiconductor constructions, and methods... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4315837