Method of designing semiconductor device including density...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification

Reexamination Certificate

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C716S111000, C716S136000

Reexamination Certificate

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08078994

ABSTRACT:
A method of designing a semiconductor device includes density verification of layout data of the semiconductor device at a macro level. The method includes disposing virtual patterns each including a predetermined step width on a circumference of a verification frame; and moving the verification frame outside which the virtual patterns are disposed sequentially by the predetermined step width and performing the density verification of the layout data of the semiconductor device.

REFERENCES:
patent: 6505325 (2003-01-01), Hamamoto
patent: 7093212 (2006-08-01), DeCamp et al.
patent: 7269807 (2007-09-01), Shimada et al.
patent: 7343580 (2008-03-01), Zorrilla et al.
patent: 2005/0204327 (2005-09-01), Mukai et al.
patent: 6-125007 (1994-05-01), None
patent: 2001-60212 (2001-03-01), None
patent: 2003-67441 (2003-03-01), None
patent: 2005-222214 (2005-08-01), None
International Search Report for PCT/JP2007/055558, mailed Apr. 17, 2007.

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