Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
Reexamination Certificate
2009-09-09
2011-12-13
Garbowski, Leigh (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
Analysis and verification
C716S111000, C716S136000
Reexamination Certificate
active
08078994
ABSTRACT:
A method of designing a semiconductor device includes density verification of layout data of the semiconductor device at a macro level. The method includes disposing virtual patterns each including a predetermined step width on a circumference of a verification frame; and moving the verification frame outside which the virtual patterns are disposed sequentially by the predetermined step width and performing the density verification of the layout data of the semiconductor device.
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International Search Report for PCT/JP2007/055558, mailed Apr. 17, 2007.
Fujitsu Semiconductor Limited
Garbowski Leigh
Staas & Halsey , LLP
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