Method for manufacturing evaporation donor substrate and...

Details Method for manufacturing evaporation donor substrate and... Method for manufacturing evaporation donor substrate and...

2008-12-22

2011-12-20

Johnston, Phillip A (Department: 2881)

Radiant energy

Irradiation of objects or material

C313S506000, C430S200000

Reexamination Certificate

active

08080811

ABSTRACT:
An evaporation donor substrate which enables only a desired evaporation material to be evaporated at the time of deposition by an evaporation method, and capable of reduction in manufacturing cost by increase in use efficiency of the evaporation material and deposition with high uniformity. An evaporation donor substrate capable of controlling laser light so that a desired position of an evaporation donor substrate is irradiated with the laser light in accordance with the wavelength of the emitted laser light at the time of evaporation. Specifically, an evaporation donor substrate in which a region which reflects laser light and a region which absorbs laser light at the time of irradiation with laser light having a wavelength of greater than or equal to 400 nm and less than or equal to 600 nm at the time of evaporation are formed.

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Urabe, T. et al, “13.1: Invited Paper: Technological Evolution for Large Screen Size Active Matrix OLED Display,” SID '07 Digest: SID International Symposium Digest of Technical Papers, 2007, pp. 161-164.

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