Chamber shield for vacuum physical vapor deposition

Details Chamber shield for vacuum physical vapor deposition Chamber shield for vacuum physical vapor deposition

2008-12-12

2011-10-25

Rosasco, Stephen (Department: 1721)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S298140

Reexamination Certificate

active

08043487

ABSTRACT:
A physical vapor deposition apparatus includes a vacuum chamber with side walls, a cathode, a radio frequency power supply, a substrate support, and anode, and a shield. The cathode is inside the vacuum chamber and includes a sputtering target. The radio frequency power supply is configured to apply power to the cathode. The substrate support is inside and electrically isolated from the side walls of the vacuum chamber. The anode is inside and electrically connected to the side walls of the vacuum chamber. The shield is inside and electrically connected to the side walls of the vacuum chamber and includes an annular body and a plurality of concentric annular projections extending from the annular body.

REFERENCES:
patent: 4622122 (1986-11-01), Landau
patent: 5202008 (1993-04-01), Talieh et al.
patent: 5234561 (1993-08-01), Randhawa et al.
patent: 6227140 (2001-05-01), Kennedy et al.
patent: 6726805 (2004-04-01), Brown et al.
patent: 7001491 (2006-02-01), Lombardi et al.
patent: 7368041 (2008-05-01), Krassnitzer
patent: 7382661 (2008-06-01), Lin
patent: 2010/0147680 (2010-06-01), Li et al.
patent: 2007-042818 (2007-02-01), None
patent: 10-2000-0051498 (2000-08-01), None
patent: 10-0779885 (2007-11-01), None
Authorized Officer Byul Sup Lee, Korean Intellectual Property Office, International Search Report and Written Opinion for International Application No. PCT/US2009/067145, dated Jul. 5, 2010, 8 pages.

Affiliated with

Also associated with

Rating

Chamber shield for vacuum physical vapor deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chamber shield for vacuum physical vapor deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chamber shield for vacuum physical vapor deposition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4292504