Apparatus for the formation of a functional deposited film using

Details Apparatus for the formation of a functional deposited film using Apparatus for the formation of a functional deposited film using

1987-12-03

1988-11-22

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118722, 118 501, C20C 1650

Patent

active

047857633

ABSTRACT:
An improved apparatus for the formation of a functional deposited film using a microwave plasma chemical vapor deposition process comprising a substantially enclosed deposition chamber having a deposition space, a supporting means for a substrate on which a functional deposited film is to be formed being placed in the deposition space, a means for supplying a raw material gas, a means for evacuating the inside of the deposition chamber, a microwave introducing means being provided with the wall of the deposition chamber and a waveguide being extended from a microwave power source, characterized in that said microwave introducing means is comprised of laminated two or more microwave transmissive plates made of a dielectric material and the surface of the outermost transmissive plate to become faced to the deposition space is of a roughened surface having a roughness of 1.5 .mu.m to about 1 cm for the height between the projection and the depression by the arithmetic mean for at least selected ten points.

REFERENCES:
patent: 4729341 (1988-03-01), Fournier

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