Liquid jet and recovery system for immersion lithography

Details Liquid jet and recovery system for immersion lithography Liquid jet and recovery system for immersion lithography

2008-09-18

2011-11-15

Glick, Edward (Department: 2882)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000, C355S067000, C355S077000

Reexamination Certificate

active

08059258

ABSTRACT:
A liquid immersion lithography apparatus includes a projection system having a last element. The projection system projects an image onto a workpiece to expose the workpiece through a liquid filled in a space between the last element and the workpiece. A liquid supply device includes a supply inlet that supplies the liquid from the supply inlet to the space between the workpiece and the last element during the exposure. The last element includes an optical element and a plate. The plate prevents the degradation of the optical element that may be affected by contact with the liquid.

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