Semiconductor device with a bulb-type recess gate

Details Semiconductor device with a bulb-type recess gate Semiconductor device with a bulb-type recess gate

2010-09-27

2011-11-01

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

08048597

ABSTRACT:
An exposure mask includes a plurality of active region patterns, and a plurality of recess patterns with a first line width, passing across the active region patterns, wherein the line width of at least one of the plurality of recess patterns neighboring one of the plurality of active region patterns is narrowed down into a second line width.

REFERENCES:
patent: 6930754 (2005-08-01), Sugita et al.
patent: 2004/0195608 (2004-10-01), Kim et al.
patent: 2005/0173759 (2005-08-01), Kim et al.
patent: 2006/0099522 (2006-05-01), Park et al.
patent: 2006/0183030 (2006-08-01), Nakao
patent: 1020050034879 (2005-04-01), None
patent: 1020050038425 (2005-04-01), None

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