Coating processes – Electrical product produced – Electron emissive or suppressive
Reexamination Certificate
2007-10-29
2011-10-18
Lin, James (Department: 1715)
Coating processes
Electrical product produced
Electron emissive or suppressive
C427S271000, C427S282000, C427S558000, C216S048000
Reexamination Certificate
active
08039042
ABSTRACT:
A method of fabricating an electron source having a self-aligned gate aperture is disclosed. A substrate is deposited on a first conductive layer. Over the first conductive layer an emitter layer is deposited. The emitter layer includes one or a plurality of spaced-apart nano-structures and a solid surface with nano-structures protruding above the surface. An insulator is conformally deposited over the emitter layer surface and forms a post from each protruding nano-structure. A second conductive layer is deposited over the insulator and the second conductive layer and the insulator are removed from the nano-structures such that apertures are formed in the second conductive layer and at least the ends of the nano-structures are exposed at the centers of said apertures.
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