Exposure apparatus and device manufacturing method

Details Exposure apparatus and device manufacturing method Exposure apparatus and device manufacturing method

2007-08-27

2011-11-15

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S072000, C355S077000, C356S237100, C356S237200, C356S237300, C356S237400, C356S237500

Reexamination Certificate

active

08059257

ABSTRACT:
An exposure apparatus includes a projection optical system configured to project light from an original, wherein the apparatus exposes a substrate to light through liquid filled in a gap between the last surface of the projection optical system and the substrate; and a detecting device configured to detect a droplet adhering to the exposed substrate. The detecting device includes a storage unit configured to prestore first image data corresponding to a surface of the substrate without the liquid and an image-capturing unit configured to capture an image of a surface of the exposed substrate. The detecting device detects the droplet based on a comparison between the first image data and second image data obtained by the image-capturing unit.

REFERENCES:
patent: 7342640 (2008-03-01), Kamono
patent: 2006/0007419 (2006-01-01), Streefkerk et al.
patent: 2006/0257553 (2006-11-01), Ohta et al.
patent: 2007/0159609 (2007-07-01), Takaiwa et al.
patent: 2007/0268466 (2007-11-01), Antonius Leenders et al.
patent: 1672681 (2006-06-01), None
patent: 06-124873 (1994-05-01), None
patent: 2002-057100 (2002-02-01), None
patent: 99/49504 (1999-09-01), None
patent: 2005/036621 (2005-04-01), None
patent: WO 2005076321 (2005-08-01), None

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