Substrate processing system

Details Substrate processing system Substrate processing system

2008-12-17

2011-10-11

Tadesse, Yewebdar (Department: 1717)

Coating apparatus

Control means responsive to a randomly occurring sensed...

Responsive to condition of coating material

C118S684000, C118S052000, C118S612000, C118S326000, C118S712000

Reexamination Certificate

active

08033244

ABSTRACT:
Leakage of an atmosphere of a solvent vapor used by a smoothing process for smoothing the surface of a resist pattern outside from a smoothing unit is prevented to facilitate incorporating the smoothing unit into a coating and developing system. A substrate processing system has a coating and developing block20, a smoothing block50, an airflow producing unit60for producing down airflow that flows down from above the coating and developing block20and the smoothing block50, and a main controller100for controlling the airflow producing unit60. The main controller100controls a flow regulating valve64aplaced in an air passage63aconnecting the airflow producing unit60to the coating and developing block20and a flow regulating valve64bplaced in an air passage63bconnecting the airflow producing unit60to the smoothing block50on the basis of a signal provided by a pressure sensor65afor measuring the pressure in the coating and developing block20and a signal provided by a pressure sensor65bfor measuring the pressure in the smoothing block50such that the pressure in the smoothing block50is lower than that in the coating and developing block20.

REFERENCES:
patent: 6399518 (2002-06-01), Ueda
patent: 6426303 (2002-07-01), Ueda
patent: 7077585 (2006-07-01), Ito
patent: 2006/0237127 (2006-10-01), Inatomi
patent: 2001-44119 (2001-02-01), None
patent: 2001-93827 (2001-04-01), None
patent: 2005-19969 (2005-01-01), None
patent: 2007-266333 (2007-10-01), None

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