Sintered silicon oxide for film vapor deposition, its...

Details Sintered silicon oxide for film vapor deposition, its... Sintered silicon oxide for film vapor deposition, its...

2011-03-04

2011-11-29

Hendrickson, Stuart (Department: 1736)

Compositions: coating or plastic

Coating or plastic compositions

Metal-depositing composition or substrate-sensitizing...

C423S324000, C423S325000, C423S335000, C427S248100, C427S255110, C427S255190, C438S778000

Reexamination Certificate

active

08066806

ABSTRACT:
A sintered silicon oxide for film vapor deposition having a density of 1.0 to 2.0 g/cm3, three-point flexural strength of at least 50 g/mm2, and a BET specific surface area of 0.1 to 20 m2/g is provided. When this sintered silicon oxide is used for evaporation source of a film, pin holes and other defects of the film caused by the problematic splash phenomenon can be reliably prevented and stable production of a reliable package material having excellent gas barrier property is been enabled. This invention also provides a method for producing such sintered silicon oxide, and this method can be used in a large scale production without requiring any special technology, and therefore, this method is capable of supplying the market with the sintered silicon oxide at reduced cost.

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Foreign Office Action dated Jun. 30, 2008.

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