Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture
Reexamination Certificate
2009-02-04
2010-06-22
Vanoy, Timothy C (Department: 1793)
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
C423S220000, C423S226000, C423S228000, C423S238000, C423S242100, C423S242200, C423S245200, C096S004000, C096S005000, C095S045000
Reexamination Certificate
active
07740816
ABSTRACT:
A method for treating gases to be scrubbed, comprising filling a scrubber with a volume of lean liquid adequate to cover a sintered permeable membrane in the reaction chamber and a bit more to create a reaction zone in not only a plurality of pores in the membrane with gases but in a reaction zone above the membrane, then introducing gases to be scrubbed to the membrane, building up pressure in the reaction chamber, and passing scrubbed gas from the reaction zone to an exit port at a rate equal to the rate of gases to be scrubbed are introduced.
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patent: 5122165 (1992-06-01), Wang et al.
patent: 5698011 (1997-12-01), Chung et al.
patent: 6592782 (2003-07-01), MacKay et al.
patent: 7147689 (2006-12-01), Miller
Matheson Kenneth R.
St. Amant Jefferey
Buskop Wendy
Buskop Law Group PC
Vanoy Timothy C
Vapor Point, LLC
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