Image sensor and method of fabricating the same

Details Image sensor and method of fabricating the same Image sensor and method of fabricating the same

2008-09-30

2010-06-08

Sohn, Seung C (Department: 2878)

Radiant energy

Photocells; circuits and apparatus

Photocell controlled circuit

C250S226000, C250S227200, C257SE31121, C257SE27134, C257S290000, C438S048000, C438S057000, C438S758000

Reexamination Certificate

active

07732746

ABSTRACT:
Provided is an image sensor including an overcoating layer and at least two micro lenses formed on the overcoating layer. The image sensor is characterized in that the overcoating layer positioned below a clearance between the micro lenses is etched such that curved surfaces of the micro lenses extend to the etched overcoating layer, and a contamination in the bonding pad can be prevented.

REFERENCES:
patent: 6081018 (2000-06-01), Nakashiba et al.
patent: 6242730 (2001-06-01), Lin et al.
patent: 6656762 (2003-12-01), Kim
patent: 6660624 (2003-12-01), Tzeng et al.
patent: 2004/0147059 (2004-07-01), Jeong et al.
patent: 10-2000-0003929 (2000-01-01), None
Office Action from the Korean Intellectual Property Office, dated Apr. 28, 2006, in related Korean Patent Application No. 10-2004-0117224.

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