Method for obtaining an abrasive coating

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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51209DL, B05D 502, E05D 1510

Patent

active

043528368

ABSTRACT:
A method of preparing an abrasive silicon oxide coating on a substrate which includes glow discharging silane and N.sub.2 O in the presence of a substrate whereby a first silicon oxide layer having a refractive index of between about 1.0 and 1.2 as measured by ellipsometry is deposited. A second silicon oxide layer having a refractive index of between about 1.30 and 1.48 as measured by ellipsometry is glow discharge deposited onto the first layer.

REFERENCES:
patent: 4104832 (1978-08-01), Keizer
patent: 4260647 (1981-04-01), Wang et al.
patent: 4282268 (1981-08-01), Priestley et al.
Joyce et al., "Silicon Oxide and Nitride Films Deposited by an R.F. Glow-Discharge, " Thin Solid Films, vol. 1, pp. 481-494 (1967/1968).

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