Method to recover the exposure sensitivity of chemically...

Details Method to recover the exposure sensitivity of chemically... Method to recover the exposure sensitivity of chemically...

2005-03-29

2010-11-02

Rosasco, Stephen (Department: 1795)

Photocopying

Projection printing and copying cameras

Step and repeat

C430S030000

Reexamination Certificate

active

07826033

ABSTRACT:
Methods of fabricating a photomask, methods of treating a chemically amplified resist-coated photomask blank, a photomask blank resulting from the methods, and systems for fabricating a photomask are provided. The method is useful for recovering the exposure sensitivity of a chemically amplified resist disposed on a photomask blank from a post-coat delay effect.

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