Method of manufacturing an analytical sample and method of...

Details Method of manufacturing an analytical sample and method of... Method of manufacturing an analytical sample and method of...

2007-10-24

2010-06-01

Gakh, Yelena G (Department: 1797)

Chemistry: analytical and immunological testing

Nuclear magnetic resonance, electron spin resonance or other...

C528S015000, C528S030000, C528S031000, C528S032000, C528S033000, C528S034000, C528S036000, C528S042000, C526S279000, C556S413000, C556S450000, C556S457000, C556S458000, C556S459000

Reexamination Certificate

active

07727773

ABSTRACT:
A method of manufacturing an analytical sample by a secondary ion mass spectrometry method is provided, which comprises a step of forming a separation layer over a substrate, a step of forming one of a thin film and a thin-film stack body to be analyzed over the separation layer, a step of forming an opening portion in one of the thin film and the thin-film stack body, a step of attaching a supporting body to one of a surface of the thin film and a surface of a top layer of the thin-film stack body, and a step of separating one of the thin film and the thin-film stack body from the substrate.

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Yeo, K. L. et al., SIMS backside depth profiling of ultrashallow implants using silicon-on-insulator substrates, 2002, Surface and Interface Analysis, vol. 33, pp. 373-375.

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