Tunable alignment geometry

Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed

Reexamination Certificate

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Details

C438S016000, C438S401000, C356S399000, C257SE21530, C257SE21211, C257SE33066

Reexamination Certificate

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07838310

ABSTRACT:
An alignment target with geometry designs provides a desired alignment offset for processes (both symmetric and asymmetric) on a wafer substrate. The alignment target includes one or more sub-targets, where each sub-target is defined as having a left portion and a right portion having a different geometric pattern, and where the left portion has a geometry density and the right portion has a geometry density.

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