Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction
Reexamination Certificate
2006-10-04
2010-06-01
Bryant, Kiesha R (Department: 2891)
Active solid-state devices (e.g., transistors, solid-state diode
Thin active physical layer which is
Heterojunction
C257S012000, C257S094000, C257SE33023, C257SE33025, C117S084000, C117S103000, C117S104000
Reexamination Certificate
active
07728323
ABSTRACT:
A nitride-based semiconductor substrate has a substrate formed of a nitride-based semiconductor crystal having a mixed crystal composition with three elements or more. The substrate has a diameter of not less than 25 mm, and a thermal resistivity in a range of 0.02 Kcm2/W to 0.5 Kcm2/W in its thickness direction.
REFERENCES:
patent: 5290393 (1994-03-01), Nakamura
patent: 6342748 (2002-01-01), Nakamura et al.
patent: 2003/0183158 (2003-10-01), Maruska et al.
patent: 2005/0066885 (2005-03-01), Kamiyama et al.
patent: 2005/0098095 (2005-05-01), D'Evelyn et al.
patent: 2005/0183658 (2005-08-01), Nakahata et al.
patent: 2006/0011135 (2006-01-01), Dmitriev et al.
patent: 4-297023 (1992-10-01), None
Liu, temperature dependence of thermal conductivity of AIGaN thin films measured by the differential 3w technique, Appl. Phys. Lett. 29, pp. 5230-5232, 2004.
D. I. Florescu et al., High Spatial Resolution Thermal Conductivity and Raman Spectroscopy Investigation of Hydride Vapor Phase Epitaxy Grownn-GaN/sapphire (0001): Doping Dependence, Journal of Applied Physics, vol. 88, No. 6, Sep. 15, 2000.
Bryant Kiesha R
Foley & Lardner LLP
Hitachi Cable Ltd.
Yang Minchul
LandOfFree
Nitride-based semiconductor substrate, method of making the... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Nitride-based semiconductor substrate, method of making the..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Nitride-based semiconductor substrate, method of making the... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4213497