Lithographic attribute enhancement

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

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C355S077000

Reexamination Certificate

active

07738075

ABSTRACT:
A method, computer program product, and apparatus configured to improve attribute uniformity of a substrate is disclosed. In an embodiment, the method involves calculating corrective data based on measured values of an attribute of a substrate processed by a lithographic exposure apparatus, the corrective data configured to at least partially correct non-uniformity of the values of the substrate attribute by controlling the temperature generated by a zone of a thermal plate used to heat or cool the substrate, and making the corrective data available to the thermal plate.

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Notice of Reasons for Rejection in Japanese Patent Application No. 2006-141464 mailed May 7, 2009, 3 pgs.

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