Liquid crystal flow forming mechanism, method of forming...

Liquid crystal cells – elements and systems – Nominal manufacturing methods or post manufacturing... – Aligning liquid crystal with means other than alignment layer

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C349S033000

Reexamination Certificate

active

07826029

ABSTRACT:
A mechanism and a method for causing a flow of liquid crystal, which can be utilized industrially, and an object-moving mechanism, which makes use of the flow of liquid crystal, are provided. A mechanism for causing a flow of liquid crystal comprising (i) a channel “L” defined by at lease one wall surface “B,” (ii) liquid crystal “LC” which is put in the channel “L” and movable along said at least one wall surface “B”, and (iii) a means for turning the molecules “m” of the liquid crystal “LC” in a plane intersecting said at least one wall surface “B.” The mechanism makes use of the flow of the liquid crystal “LC” which is caused when the molecules “m” of the liquid crystal “LC” are turned. When the means for turning the molecules “m” of the liquid crystal “LC” turns the molecules “m” of the liquid crystal “LC” in a plane intersecting said at least one wall surface “B,” the liquid crystal “LC” flows along said at least one wall surface “B.” The flow of the liquid crystal “LC” can easily be utilized for making object-moving devices, sensors, actuators, etc.

REFERENCES:
patent: 2002/0063829 (2002-05-01), Manabe et al.
patent: 2003/0160913 (2003-08-01), Yamashita
patent: 2005/0134778 (2005-06-01), Tsuboi et al.
patent: 06-046584 (1994-02-01), None
patent: 3005263 (1994-05-01), None
patent: 08-270615 (1996-10-01), None
patent: 11-230023 (1999-08-01), None
patent: 2001-013895 (2001-01-01), None
patent: 2001-260100 (2001-09-01), None
PCT/JP02/10129, English translation of Japanese examiner's comments.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Liquid crystal flow forming mechanism, method of forming... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Liquid crystal flow forming mechanism, method of forming..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Liquid crystal flow forming mechanism, method of forming... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4208340

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.