Method of manufacturing circuit board embedding thin film...

Metal working – Method of mechanical manufacture – Electrical device making

Reexamination Certificate

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C029S830000, C029S831000, C029S832000, C438S046000, C438S093000, C438S455000

Reexamination Certificate

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07845073

ABSTRACT:
A method of manufacturing a circuit board embedding a thin film capacitor, the method including: forming a sacrificial layer on a first substrate; forming a dielectric layer on the sacrificial layer; forming a first electrode layer on the dielectric layer; disposing the first substrate on the second substrate in such a way that the first electrode layer is bonded to a top of a second substrate; decomposing the sacrificial layer by irradiating a laser beam onto the sacrificial layer through the first substrate; separating the first substrate from the second substrate; and forming a second electrode layer on the dielectric layer.

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patent: 2006/0076584 (2006-04-01), Kim et al.
patent: 2004-260176 (2004-09-01), None
patent: 2005-039234 (2005-02-01), None
patent: 2005-252308 (2005-09-01), None
patent: 10-2006-0067188 (2006-06-01), None
Japanese Office Action, w/ English translation thereof, issued in Japanese Patent Application No. JP 2007-321378 dated Mar. 9, 2010.

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