Implanted counted dopant ions

Active solid-state devices (e.g. – transistors – solid-state diode – With specified dopant

Reexamination Certificate

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C257S609000, C438S518000

Reexamination Certificate

active

07834422

ABSTRACT:
This invention concerns semiconductor devices of the general type comprising a counted number of dopant atoms (142) implanted in regions of a substrate (158) that are substantially intrinsic semiconductor. One or more doped surface regions (152) of the substrate (158) are metallized to form electrodes (150) and a counted number of dopant ions (142) are implanted in a region of the substantially intrinsic semiconductor.

REFERENCES:
patent: 3996655 (1976-12-01), Cunningham et al.
patent: 4744616 (1988-05-01), Robinson et al.
patent: 405326437 (1993-12-01), None
patent: 1002-023917 (2001-01-01), None
patent: 20011023917 (2001-01-01), None
patent: 2002368252 (2002-12-01), None
patent: WO 03/019635 (2003-03-01), None
English tranlation of Japanese Patent JP 2002368252 by Sasaki ( Dec. 2002).
English translation of Japanese Patent JP2001023917 by Iwao ( Jan. 2001 ).
Miitic M. et al: “Single atom S1 Nanoelectronics Using Controlled Single-Ion Implantation”; Microelectronic Engineering, Elsevier Publishers BV., Amsterdam, NL, vol. 78-79, Mar. 1, 2005, pp. 279-286.
Schenkel T. et al.: “Solid State Quantum Computer Development in Silicon With Single Ion Omplantation”, Journal of Applied Physics AIP USA, vol. 94, No. 11, Dec. 1, 2003, pp. 7017-7024.
Gujrathi S. C. et al.: “The Detection of Heavy Ions With Pin Diodes”, Nuclear Instruments & Methods in Physics Research, Section B (Beam Interactions with Materials and Atoms), Netherlands, vol. B45, No. 1-4, Jan. 1990 , pp. 260-264.
Kamiya T. et al.: “An Automated Single Ion Hit at JAERI Heavy Ion Microbeam to Observe Individual Radiation Damage”, Nuclear Instruments & Methods in Physics Research, Section—B: Beam Interactions with Materials and Atoms, Elsevier, Amsterdam, NL, vol. 158, No. 1-4, Sep. 2, 1999 , pp. 255-259.

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