Method of making sputtering target

Details Method of making sputtering target Method of making sputtering target

2005-02-22

2010-11-16

Ward, Jessica L (Department: 1793)

Metal fusion bonding

Process

Diffusion type

Reexamination Certificate

active

07832619

ABSTRACT:
A method of making a large Mo billet or bar for a sputtering target wherein two or more bodies comprising Mo are placed adjacent one another (e.g. stacked one on the other) with Mo powder metal present at gaps or joints between the adjacent bodies. The adjacent bodies are hot isostatically pressed to form a diffusion bond at each of the metal-to-Mo powder layer-to-metal joint between adjacent bodies to form a billet or bar that can be machined or otherwise formed to provide a large sputtering target. The number and dimensions of the Mo bodies placed adjacent one another are selected to yield a desired large size the billet or bar suitable for the sputtering target. The billet or bar for the sputtering target exhibits a microstructure comprising equiaxed grains of less than 30 microns grain size and exhibits a low oxygen content of less than about 100 ppm by weight.

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Hirakawa et al. JP 2003-129232 which published on May 2003, Certified Translation of the Japanese document.

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