Production process of copolymer for semiconductor lithography

Details Production process of copolymer for semiconductor lithography Production process of copolymer for semiconductor lithography

2004-08-31

2010-11-23

Cheung, William K (Department: 1796)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

C526S319000

Reexamination Certificate

active

07838606

ABSTRACT:
Efficient and reproducible production of a copolymer for lithography, which has stable quality, with little lot-to-lot variations, and is suited for film-forming and coating compositions. Radical polymerization of a monomer, which contains at least one ethylenic double bond, with an initiator, in a solvent, and purification of the reaction mixture by precipitation and filtration, in a hermetically-closable single vessel divided by a filter medium, into a first section provided with fluid feeding means and agitating means, and a second section with fluid drawing means. Feeding the reaction mixture from the fluid feeding means into the first section of the vessel, containing a poor solvent, and contacting the reaction mixture with the poor solvent to precipitate a solid; and filtering the resulting fluid, containing the precipitated solid, through the filter medium, drawing the resultant filtrate through the fluid drawing means, and then separating the precipitated solid.

REFERENCES:
patent: 2202055 (1940-05-01), Juffa
patent: 4212848 (1980-07-01), Boehme et al.
patent: 5662805 (1997-09-01), Cameron et al.
patent: 6730762 (2004-05-01), Lousenberg et al.
patent: 59-45439 (1984-03-01), None
patent: 62-115440 (1987-05-01), None
patent: 3-223860 (1991-10-01), None
patent: 4-104251 (1992-04-01), None
patent: 4-219757 (1992-08-01), None
patent: 5-113667 (1993-05-01), None
patent: 7-209868 (1995-08-01), None
patent: 9-73173 (1997-03-01), None
patent: 10-239846 (1998-09-01), None
patent: 11-65120 (1999-03-01), None
patent: 2000-313779 (2000-11-01), None
patent: 2001-27810 (2001-01-01), None
patent: 2001-109153 (2001-04-01), None
patent: 2001-192411 (2001-07-01), None
patent: 2001-226324 (2001-08-01), None
patent: 2002-201210 (2002-07-01), None
patent: 2002-229220 (2002-08-01), None
patent: 2003-57828 (2003-02-01), None
patent: 2003-231721 (2003-08-01), None

Affiliated with

Also associated with

Rating

Production process of copolymer for semiconductor lithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Production process of copolymer for semiconductor lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Production process of copolymer for semiconductor lithography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4191105