Photomask and method for fabricating the same

Details Photomask and method for fabricating the same Photomask and method for fabricating the same

2006-12-27

2010-10-12

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C716S030000

Reexamination Certificate

active

07811722

ABSTRACT:
A photomask comprises a transparent substrate, a peripheral pattern formed on the transparent substrate along a contour of a target pattern to be transferred onto a wafer, and an assist pattern disposed inside the peripheral pattern. The photomask has the assist pattern formed inside the target pattern, thereby preventing the assist pattern from being undesirably on the target pattern. In addition, the method can fabricate the assist pattern in a complicated structure which cannot be realized by the conventional technique, so that it can be applied to any kinds of patterns.

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patent: 10-2002-0053753 (2002-07-01), None
patent: 10-2005-0069505 (2005-07-01), None
patent: 10-2005-0069506 (2005-07-01), None

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