Method of making a free standing structure

Details Method of making a free standing structure Method of making a free standing structure

2003-10-03

2010-02-16

Tran, Binh X (Department: 1792)

Etching a substrate: processes

Gas phase and nongaseous phase etching on the same substrate

C216S091000, C216S102000

Reexamination Certificate

active

07662301

ABSTRACT:
A method of producing a free standing structure, the method comprising: providing a substrate having a raised pattern formed on a surface of said substrate, said raised pattern comprising at least one material which forms said surface; depositing material over said raised pattern; and dissolving said substrate to release said deposited material to form said free standing structure from said released deposited material.

REFERENCES:
patent: 5129974 (1992-07-01), Aurenius
patent: 6096175 (2000-08-01), Roth
patent: 6790298 (2004-09-01), Johnson et al.
patent: 6919009 (2005-07-01), Stonas et al.
patent: 2001/0001472 (2001-05-01), Sano et al.
patent: 2002/0076575 (2002-06-01), Yang et al.
patent: 2003/0053190 (2003-03-01), Liang et al.
patent: 2004/0002752 (2004-01-01), Griffin et al.
patent: 2004/0071951 (2004-04-01), Jin
patent: 624 434 (1981-07-01), None
patent: 2 306 484 (1997-05-01), None
patent: 2 320 571 (1998-06-01), None
patent: WO 00/16893 (2000-03-01), None
patent: WO 01/78889 (2001-10-01), None

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