Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2005-01-28
2010-02-09
Carter, Aaron W (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S199000, C382S209000, C348S086000, C348S125000, C356S237100
Reexamination Certificate
active
07660455
ABSTRACT:
First, a pattern inspection apparatus detects the first edge from an image of a pattern to-be-inspected. Next, the pattern inspection apparatus conducts matching of the image of the pattern to-be-inspected and the first reference pattern by comparing the first edge and an edge of the first reference pattern. Since, as a result of the matching, a shift quantity S1can be obtained, and then the first reference pattern is shifted by this shift quantity S1. Subsequently the pattern to-be-inspected is inspected by comparing the first edge and the edge of the first reference pattern so shifted. In this first inspection, pattern deformation quantities are obtained and defects are detected. A shift quantity S2can be obtained as one of the pattern deformation quantities. Next, in order to detect the second edge from the pattern image to-be-inspected, the corresponding second reference pattern is shifted by a shift quantity S1+S2. Using the second reference pattern so shifted, a profile is obtained on the pattern image to-be-inspected and the second edge is detected. Then, by comparing the second edge and the edge of the second reference pattern so shifted, the pattern to-be-inspected is inspected. Also in this second inspection, the pattern deformation quantities are obtained and defects are detected. A shift quantity S3can be obtained as one of the pattern deformation quantities.
REFERENCES:
patent: 4805123 (1989-02-01), Specht et al.
patent: 5046109 (1991-09-01), Fujimori et al.
patent: 5129009 (1992-07-01), Lebeau
patent: 5137362 (1992-08-01), LeBeau
patent: 5379350 (1995-01-01), Shimazu et al.
patent: 5398292 (1995-03-01), Aoyama
patent: 5479537 (1995-12-01), Hamashima et al.
patent: 5563702 (1996-10-01), Emery et al.
patent: 5600734 (1997-02-01), Okubo et al.
patent: 5801965 (1998-09-01), Takagi et al.
patent: 6023530 (2000-02-01), Wilson
patent: 6040911 (2000-03-01), Nozaki et al.
patent: 6047083 (2000-04-01), Mizuno
patent: 6868175 (2005-03-01), Yamamoto et al.
patent: 7181059 (2007-02-01), Duvdevani et al.
patent: 7206443 (2007-04-01), Duvdevani et al.
patent: 7388978 (2008-06-01), Duvdevani et al.
patent: 2004/0120571 (2004-06-01), Duvdevani et al.
patent: 2004/0126005 (2004-07-01), Duvdevani et al.
patent: 19803021 (1998-07-01), None
patent: 0930499 (1999-07-01), None
patent: 63-88682 (1988-04-01), None
patent: 4-194702 (1992-07-01), None
patent: 02299481 (1992-09-01), None
patent: 8-76359 (1996-03-01), None
patent: 08110305 (1996-04-01), None
patent: 10307917 (1998-11-01), None
patent: 10312461 (1998-11-01), None
patent: 10037364 (1999-08-01), None
“Automatic Failure Part Tracing Method for a Logic LSI Using an Electron Beam Tester”,NEC Technical Report, vol. 50, No. 6, pp.21-31, 1997.
R. M. Haralick, “Digital Step Edges From ZERO Crossing of Second Directional Derivatives”,IEEE Transactions on Pattern Analysis Machine Intelligence, vol. PAMI-6, No. 1, pp. 58-68, 1984.
Carsten Steger, “An Unbiased Detector of Curvilinear Structures”,IEEE Transactions on Pattern Analysis Machine Intelligence, vol. 20, No. 2, pp. 113-125, Feb. 1998.
M. Hashimoto et al., “High-Speed Template Matching Algorithm Using Information of Contour Points,” Systems and Computers in Japan, vol. 23, No. 9, pp. 78-87, 1992.
Official Notice of Rejection, Japanese Patent Office, dated Feb. 21, 2003, for Patent Appln. No. 2000-258234 with English translation.
Kitamura Tadashi
Yamamoto Masahiro
Carter Aaron W
Finnegan Henderson Farabow Garrett & Dunner LLP
Nanogeometry Research Inc.
LandOfFree
Pattern inspection apparatus, pattern inspection method, and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Pattern inspection apparatus, pattern inspection method, and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern inspection apparatus, pattern inspection method, and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4181302