Pattern based elaboration of hierarchical L3GO designs

Registers – Records – Particular code pattern

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C235S375000

Reexamination Certificate

active

07823795

ABSTRACT:
A system, method and program product that utilizes flat pattern based L3GO elaboration in a hierarchical environment to create a nested conventional layout. A system is provide for processing a glyph layout to generate shapes for use in a VLSI (very large scale integrated circuit) design process, including: a hierarchical pattern search system that matches patterns from a pattern library to a set of glyph data, wherein the patterns have dependencies that cross hierarchical design boundaries; and a target shape generation system that selects patterns from a set of matching patterns and generates associated shapes.

REFERENCES:
patent: 5539841 (1996-07-01), Huttenlocher et al.
patent: 7603351 (2009-10-01), Mansfield et al.
patent: 2006/0043203 (2006-03-01), Floriach et al.
patent: 2006/0237546 (2006-10-01), Lapstun et al.
patent: 2007/0250497 (2007-10-01), Mansfield et al.
patent: 2007/0262993 (2007-11-01), Fux et al.
patent: 2008/0037070 (2008-02-01), Chen
patent: 2008/0218522 (2008-09-01), Fux et al.
patent: 2009/0327285 (2009-12-01), Mansfield et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Pattern based elaboration of hierarchical L3GO designs does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern based elaboration of hierarchical L3GO designs, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern based elaboration of hierarchical L3GO designs will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4180057

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.