Silica film forming material, silica film and method of...

Details Silica film forming material, silica film and method of... Silica film forming material, silica film and method of...

2005-11-16

2010-02-09

Gonzalez, Porfirio Nazario (Department: 1621)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From silicon reactant having at least one...

C257S499000, C438S781000

Reexamination Certificate

active

07659357

ABSTRACT:
The silica film forming material of the present invention comprises a silicone polymer which comprises, as part of its structure, CHx, an Si—O—Si bond, an Si—CH3bond and an Si—CHx- bond, where x represents an integer of 0 to 2.

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patent: WO 01/48806 (2001-07-01), None
Chinese Office Action dated Dec. 14, 2007 (mailing date), issued in corresponding Chinese Patent Application No. 200510128973.4.

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