Method and apparatus for extracting characteristic of...

Details Method and apparatus for extracting characteristic of... Method and apparatus for extracting characteristic of...

2006-03-27

2010-11-16

Le, John H (Department: 2863)

Data processing: measuring, calibrating, or testing

Measurement system

Measured signal processing

C365S149000, C702S117000, C716S030000

Reexamination Certificate

active

07835888

ABSTRACT:
A method for efficiently extracting a variation distribution of a characteristic for a semiconductor integrated circuit. The method extracts a characteristic distribution of a semiconductor integrated circuit by performing a mathematical analysis using a polynomial expression based on a variation distribution of a process sensitivity parameter.

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patent: 2003-196341 (2003-07-01), None
patent: 2005-019524 (2005-01-01), None
patent: WO 97/21244 (1997-06-01), None
Tomohiro, Fujita et al., “Statistical Delay Analysis of Large Scale Integrated Circuit”,DA Symposium 2000Jul. 2000, 91-96, Partial English Translation.

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