Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2005-12-09
2010-06-22
Vinh, Lan (Department: 1792)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S714000, C438S723000, C216S067000, C216S072000
Reexamination Certificate
active
07741229
ABSTRACT:
A method for manufacturing a magnetic recording medium is provided, which can manufacture a magnetic recording medium that includes a recording layer having a concavo-convex pattern and has a sufficiently flat surface. The method includes the steps of: forming an object to be processed including a recording layer having a predetermined concavo-convex pattern formed over a substrate and a first mask layer (temporary underlying material) formed at least on recording elements (convex portions) of the recording layer; depositing a filling material on the object to be processed to fill concave portions; removing a part of the filling material by dry etching to expose at least side faces of the first mask layer; and removing the first mask layer by an etching method in which an etching rate of the first mask layer is higher than that of the filling material to flatten a surface.
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Okawa Shuichi
Shimakawa Kazuya
Suwa Takahiro
Oliff & Berridg,e PLC
TDK Corporation
Vinh Lan
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