Method for manufacturing magnetic recording medium

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching

Reexamination Certificate

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Details

C438S714000, C438S723000, C216S067000, C216S072000

Reexamination Certificate

active

07741229

ABSTRACT:
A method for manufacturing a magnetic recording medium is provided, which can manufacture a magnetic recording medium that includes a recording layer having a concavo-convex pattern and has a sufficiently flat surface. The method includes the steps of: forming an object to be processed including a recording layer having a predetermined concavo-convex pattern formed over a substrate and a first mask layer (temporary underlying material) formed at least on recording elements (convex portions) of the recording layer; depositing a filling material on the object to be processed to fill concave portions; removing a part of the filling material by dry etching to expose at least side faces of the first mask layer; and removing the first mask layer by an etching method in which an etching rate of the first mask layer is higher than that of the filling material to flatten a surface.

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