Ion beam method for removing an organic light emitting material

Etching a substrate: processes – Forming or treating optical article

Reexamination Certificate

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Details

C216S041000, C216S045000, C216S048000, C216S066000

Reexamination Certificate

active

07731860

ABSTRACT:
A method of removing an organic, preferably polymeric, light-emitting material (4) from defined areas of a substrate (1) comprises the steps of arranging a shadow mask (5) to overlie the organic material other than in the defined areas, and applying a beam of ions (7) to the defined areas through the mask. The method is useful in forming organic light-emitting diode arrays.

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