Programmable self-aligning liquid magnetic nanoparticle...

Radiation imagery chemistry: process – composition – or product th – Plural exposure steps

Reexamination Certificate

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C430S005000, C424S489000

Reexamination Certificate

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07838208

ABSTRACT:
Magnetic nanoparticle masks for lithographic applications of a substrate and methods for producing such masks via defining regions of localized magnetic field maxima and minima on a substrate are provided. Also provided are methods for producing multi-component patterns on a substrate with the magnetic nanoparticle masks.

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