Non-aqueous microelectronic cleaning compositions containing...

Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...

Reexamination Certificate

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Details

C510S175000, C510S245000, C510S255000, C510S265000, C510S266000, C510S493000, C510S499000, C510S500000, C510S501000

Reexamination Certificate

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07825078

ABSTRACT:
Back end photoresist strippers and residue compositions are provided by non-aqueous compositions that are essentially non-corrosive toward copper as well as aluminum and that comprise a polar organic solvent, a hydroxylated amine, and as a corrosion inhibitor fructose.

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patent: 6140027 (2000-10-01), Baik et al.
patent: 6440326 (2002-08-01), Maruyama et al.
patent: 6638694 (2003-10-01), Ikemoto et al.
patent: 2003/0186175 (2003-10-01), Ikemoto et al.
patent: 0647884 (1995-04-01), None
patent: 1347339 (2003-09-01), None
patent: WO 03/007085 (2003-01-01), None

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