Methods of manufacturing mask blank and transfer mask

Details Methods of manufacturing mask blank and transfer mask Methods of manufacturing mask blank and transfer mask

2008-11-04

2010-02-02

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S296000, C430S942000

Reexamination Certificate

active

07655364

ABSTRACT:
In a method of manufacturing a mask blank adapted to be formed with a resist pattern by electron beam writing and having a light-shielding film and an etching mask film of an inorganic-based material resistant to etching of the light-shielding film which are formed in this order on a transparent substrate, when forming the etching mask film, shielding is performed using a shielding plate so as to prevent the etching mask film from being formed at least at a side surface of the substrate.

REFERENCES:
patent: 6762000 (2004-07-01), Nozawa et al.
patent: 2002/0110741 (2002-08-01), Nozawa et al.
patent: 08-137089 (1996-05-01), None
patent: 2002-090977 (2002-03-01), None
patent: 2006-184353 (2006-07-01), None

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