Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2005-05-03
2009-11-17
Bella, Matthew C (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
Reexamination Certificate
active
07620232
ABSTRACT:
According to the present invention, for a pattern inspection apparatus that compares images in corresponding areas of two patterns that are identical and that determines an unmatched portion between the images is a defect, a plurality of detection systems and a plurality of corresponding image comparison methods are provided. With this configuration, the affect of uneven brightnesses for a pattern that occurs due to differences in film thicknesses can be reduced, a highly sensitive pattern inspection can be performed, a variety of defects can be revealed, and the pattern inspection apparatus can be applied for processing performed within a wide range. Furthermore, the pattern inspection apparatus also includes a unit for converting the tone of image signals of comparison images for a plurality of different processing units, and when a difference in brightness occurs in the same pattern of the images, a defect can be correctly detected.
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Maeda Shunji
Nishiyama Hidetoshi
Sakai Kaoru
Antonelli, Terry Stout & Kraus, LLP.
Bella Matthew C
Hitachi High-Technologies Corporation
Liew Alex
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