Direct reduction process and apparatus

Specialized metallurgical processes – compositions for use therei – Processes – Producing or treating free metal

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C075S450000, C266S172000

Reexamination Certificate

active

07608128

ABSTRACT:
A direct reduction process for a metalliferous material includes supplying a solid carbonaceous material and an oxygen-containing gas into a fluidized bed in a first vessel and generating heat by reactions between the oxygen-containing gas and the solid carbonaceous material and any other oxidizable solids and gases in the fluidized bed and discharging a hot off-gas stream containing entrained solids. The process also includes supplying the metalliferous material to a fluidized bed in a second vessel and supplying the hot off-gas stream containing entrained solids from the first vessel to the fluidized bed in the second vessel and partially reducing the metalliferous feed material in the solid state in the fluidized bed and discharging a product stream of partially reduced metalliferous material and an off-gas stream containing entrained solids.

REFERENCES:
patent: 4806158 (1989-02-01), Hirsch et al.
patent: 5603748 (1997-02-01), Hirsch et al.
patent: 6053961 (2000-04-01), Satchell, Jr.
Bresser W et al: “Circored and Circofer:State of the Art Technology for Low Cost Direct Reduction,” Iron and Steel Engineer, Association of Iron and Steel Engineers, Pittsburgh, U.S, vol. 72, No. 4, Apr. 1, 1995, pp. 81-85.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Direct reduction process and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Direct reduction process and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Direct reduction process and apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4123406

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.