Metal working – Barrier layer or semiconductor device making
Reexamination Certificate
2006-03-31
2009-02-17
Smith, Zandra (Department: 2822)
Metal working
Barrier layer or semiconductor device making
Reexamination Certificate
active
07491246
ABSTRACT:
An electrolytic capacitor cell for use in implantable medical devices and associated method for manufacture are provided. The capacitor cell includes an electrode substrate having a dielectric layer formed thereon by atomic layer deposition. In various embodiments, the dielectric layer includes an oxide of one or more valve metals.
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Francis Richard W. A.
Hossick-Schott Joachim
Istephanous Naim S.
Norton John D.
Rorvick Anthony W.
Barry Carol F.
Medtronic Inc.
Patton Paul E
Smith Zandra
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