Optics: measuring and testing – By light interference – For dimensional measurement
Reexamination Certificate
2006-02-15
2009-02-17
Lee, Hwa (Andrew) S (Department: 2886)
Optics: measuring and testing
By light interference
For dimensional measurement
C356S514000
Reexamination Certificate
active
07492469
ABSTRACT:
In general, in one aspect, the invention features an apparatus that includes an interferometer having a main cavity and an auxiliary reference surface, the main cavity including a partially reflective surface defining a primary reference surface and a test surface. The interferometer is configured to direct a primary portion of input electromagnetic radiation to the main cavity and an auxiliary portion of the input electromagnetic radiation to reflect from the auxiliary reference surface, wherein a first portion of the primary portion in the main cavity reflects from the primary reference surface and a second portion of the primary portion in the main cavity passes through the primary reference surface and reflects from the test surface. The interferometer is further configured to direct the electromagnetic radiation reflected from the test surface, the primary reference surface, and the auxiliary reference surface to a multi-element detector to interfere with one another to form an interference pattern. The auxiliary reference surface is tilted so that the paths of the electromagnetic radiation reflected from the primary reference surface and auxiliary reference are non-parallel at the multi-element detector and the auxiliary reference surface is in the path of the primary portion of the electromagnetic radiation.
REFERENCES:
patent: 4468122 (1984-08-01), Puryaev
patent: 6359692 (2002-03-01), de Groot
patent: 6624894 (2003-09-01), Olszak et al.
patent: 6744522 (2004-06-01), De Groot et al.
patent: 6882432 (2005-04-01), Deck
patent: 6924898 (2005-08-01), Deck
patent: 7042578 (2006-05-01), Deck
patent: 7050175 (2006-05-01), Friemann et al.
patent: 7057738 (2006-06-01), Millerd et al.
patent: 2002/0051134 (2002-05-01), Ge
patent: 2005/0200856 (2005-09-01), de Groot
patent: 2006/0139656 (2006-06-01), Kulawiec et al.
Dörband, B. et al., “Interferometric testing of optical surfaces at its current limit,”Optik112(9):392-298 (2001).
Küchel, M., “The new Zeiss interferometer,”Proceedings of SPIE, 1332, 655-663 (1990).
Kujawinska, M., “Spatial phase measurement methods,”Interferogram Analysis, (D.W. Robinson and G.T. Reid, Inst. of Physics Publishing, Bristol and Philadelphia), 145-167 (1993).
Macy, Jr., W., “Two dimensional fringe-pattern analysis,”Appl. Opt. 22(23):3898-3901 (1983).
Malacara, D. et al., “Spatial linear and circular carrier analysis,”Interferogram Analysis for Optical Testing, New York: Marcel Dekker, 285-335 (1998).
Millerd, J. et al., “Pixelated phase-mask dynamic interferometer,”Proceedings of SPIE, 5531:304-314 (2004).
Smythe, R. et al., “Instantaneous phase measuring interferometry,”Proceedings of SPIE, 429:16-21 (1983).
Fish & Richardson P.C.
Lee Hwa (Andrew) S
Zygo Corporation
LandOfFree
Interferometry systems and methods using spatial carrier... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Interferometry systems and methods using spatial carrier..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Interferometry systems and methods using spatial carrier... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4117793