Process and apparatus for simultaneous light and radical...

Details Process and apparatus for simultaneous light and radical... Process and apparatus for simultaneous light and radical...

2005-01-31

2009-06-30

Everhart, Caridad M (Department: 2895)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S711000, C438S798000, C257SE21328, C257SE21475, C427S509000, C427S554000

Reexamination Certificate

active

07553772

ABSTRACT:
Process and apparatus provide reactive radicals generated from a remote plasma source which contact a portion of a substrate surface simultaneous with a contact of the same substrate surface with a light source which locally activates the portion of the substrate surface in contact with said radicals.

REFERENCES:
patent: 4687544 (1987-08-01), Bersin
patent: 4818326 (1989-04-01), Liu et al.
patent: 5014646 (1991-05-01), Ito et al.
patent: 6995051 (2006-02-01), Furukawa et al.
patent: 7094670 (2006-08-01), Collins et al.
patent: 2002/0182877 (2002-12-01), Nantel et al.

Affiliated with

Also associated with

Rating

Process and apparatus for simultaneous light and radical... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process and apparatus for simultaneous light and radical..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process and apparatus for simultaneous light and radical... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4113161