Photomask to which phase shift is applied and exposure...

Details Photomask to which phase shift is applied and exposure... Photomask to which phase shift is applied and exposure...

2006-03-10

2009-10-27

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C355S053000

Reexamination Certificate

active

07608369

ABSTRACT:
A problem of a decrease in transmissive light, which partly occurs at a boundary between two polarization modulation regions of a polarized phase shift mask, is solved. A photomask for use in an exposure apparatus which forms an exposure pattern by illumination includes at least two polarization modulation regions which produce mutually incoherent polarized light components and adjoin each other, at least two phase modulation regions which impart a phase difference of 180° and adjoin each other, and amplitude modulation regions which decrease transmittance. A contact line between the polarization modulation regions and a contact line between the phase modulation regions are located at a corresponding position, and the amplitude modulation regions are provided on both sides of the common contact line, with a predetermined distance from the common contact line.

REFERENCES:
patent: 5677755 (1997-10-01), Oshida et al.
patent: 2002/0068227 (2002-06-01), Wang et al.
patent: 5-11434 (1993-01-01), None
patent: 7-36174 (1995-02-01), None
patent: 7-176476 (1995-07-01), None
patent: 9-120154 (1997-05-01), None
patent: 2002-116528 (2002-04-01), None
Ruoping Wang, et al., “Polarized Phase Shift Mask: Concept, Design, and Potential Advantages to Photolithography Process and Physical Design”, Proceedings of SPIE, vol. 4562, 2002, pp. xix-xxx.

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