Coating apparatus – Gas or vapor deposition – With treating means
Patent
1994-12-13
1996-09-17
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
With treating means
156345, 20429807, 20429833, C23C 1600
Patent
active
055564747
ABSTRACT:
In a plasma processing apparatus, wherein a power application electrode for generating plasma and an electrode opposed thereto are disposed in a process chamber which can be exhausted to attain a predetermined vacuum pressure, an electric power is applied to the power application electrode to generate the plasma from a process gas introduced between the electrodes, and intended plasma processing is effected on a substrate mounted on one of the electrodes in the plasma, the apparatus includes a particle discharge duct which surrounds a periphery and a rear side of the power application electrode and has an opening at a position neighboring to the periphery of the power application electrode, and an exhaust device connected to the duct at a position corresponding to a central portion of the rear side of the power application electrode.
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Kirimura Hiroya
Kuwahara Hajime
Murakami Hiroshi
Nakahigashi Takahiro
Otani Satoshi
Breneman R. Bruce
Chang Joni Y.
Nissin Electric Co. Ltd.
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