Substrate for pattern formation

Details Substrate for pattern formation Substrate for pattern formation

2005-11-10

2009-10-06

Garrett, Dawn (Department: 1794)

Stock material or miscellaneous articles

Composite

Of inorganic material

C428S917000, C313S504000, C313S506000

Reexamination Certificate

active

07597968

ABSTRACT:
A substrate for pattern formation, which includes a base material, a wettability inhibition part formed in a functional part formation region to be provided with a functional part on the base material, and a wettability inhibition examining part formed in a functional part non formation region without the functional part provided on the bases material is provided. The same constituent materials are used for the wettability inhibition part and the wettability inhibition examining part.

REFERENCES:
patent: 5900645 (1999-05-01), Yamada
patent: 6294313 (2001-09-01), Kobayashi et al.
patent: 6573650 (2003-06-01), Aoki et al.
patent: 2003/0127969 (2003-07-01), Aoki et al.
patent: 2003/0193624 (2003-10-01), Kobayashi et al.
patent: 1376224 (2004-01-01), None
patent: 2000-223270 (2000-08-01), None
patent: 2000-353594 (2000-12-01), None
patent: 2002-022933 (2002-01-01), None
patent: 2003-121384 (2003-04-01), None
patent: 2003332080 (2003-11-01), None
Machine Translation of JP 2003-121384 (Apr. 2003).

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