Mesostructured film, mesoporous material film, and...

Stock material or miscellaneous articles – Web or sheet containing structurally defined element or... – Composite having voids in a component

Reexamination Certificate

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C428S137000, C428S158000, C428S312600

Reexamination Certificate

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07618703

ABSTRACT:
A mesostructured film is provided having a structure in which surfactant molecular assemblies are regularly arranged three-dimensionally. A polymer compound thin film is formed on the substrate surface through spin coating or the like, and a rotating roller wrapped with a cloth is pressed against the polymer film for rubbing in one direction. The polymer material includes polyimide, polyamide, and polystyrene. The substrate includes a silica glass substrate and a silicon substrate. The mesostructured film can be formed by retaining the substrate in an aqueous solution containing a surfactant, silicon alkoxide, and acid. After being retained in the solution, the substrate is heated at about 60 to 120° C. for several hours to several days for reaction. The surfactant includes C18H37(OCH2CH2)20OH and C16H33(OCH2CH2)20OH. The alkoxide included tetraethoxysilane, tetramethoxysilane, and tetrapropoxysilane. Hydrochloric acid, nitric acid, or sulfuric acid is used as a catalyst.

REFERENCES:
patent: 6984414 (2006-01-01), Miyata
patent: 2002/0034626 (2002-03-01), Liu et al.
patent: 2003/0012931 (2003-01-01), Kuroda et al.
patent: 2006/0062909 (2006-03-01), Miyata
patent: WO 2004/015167 (2004-02-01), None
Besson et al., “A New 3D Organization of Mesopores in Oriented CTAB Silica Films”, J. Phys. Chem. B 2000, 104, 12095-12097, XP-002304393.
Grosso et al., “Highly oriented 3D-hexagonal silica . . . bromide”, J. Mater. Chem., vol. 10, No. 9, pp. 2085-2089 (2000).
Patent Abstracts of Japan, vol. 2003, No. 3 (2003).
Tolbert, et al., “A New Phase of Oriented Mesoporous . . . Thin Films”; Chem. Mater., vol. 9, No. 9, 1962-1967 (1997).
Zhao, et al; “Continuous Mesoporous Silica Films . . . Structures”; Adv. Mater., vol. 10, No. 16, 1380-1385 (1998).
Miyata, et al.; “Alignment of Mesoporous Silica . . . A Rubbing Method”; Chem. Mater., vol. 11, No. 6, 1609-1614 (1999).

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