Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-06-30
2009-02-24
Rosasco, Stephen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07494750
ABSTRACT:
The invention includes reticles and methods of forming reticles. In one aspect, a reticle can include a quartz-containing substrate, an attenuating layer, and an antireflective structure between the attenuating layer and the quartz-containing substrate. The invention can also include a reticle having a relatively transparent region between first and second surfaces, a relatively opaque region proximate the first surface, and a layer comprising one or both of metal fluoride and hafnium oxide proximate the first or second surface. The invention can also include methods of forming reticles in which an antireflective structure is formed over a surface of a quartz-containing substrate. The antireflective structure can comprise a Fabry-Perot pair, and in some aspects can comprise a layer containing one or both of metal fluoride and hafnium oxide.
REFERENCES:
patent: 5780161 (1998-07-01), Hsu
patent: 5897977 (1999-04-01), Carcia et al.
patent: 6194103 (2001-02-01), Tzu et al.
patent: 6590694 (2003-07-01), Matsushita et al.
patent: 6797439 (2004-09-01), Alpay
patent: 2001/0028983 (2001-10-01), Kawamura et al.
patent: 2002/0132171 (2002-09-01), Levinson et al.
patent: 475094 (2002-02-01), None
US05/43549, Dec. 21, 2007, IPER.
US2005/043549, Jul. 10, 2006, PCT Written Opinion.
http://www.cerac.com/pubs/prodata/hfo2.htm CERAC, Inc.; Technical Publications; “Hafnium Oxide, HfO2 For Optical Coating”.
Chen, H. et al., “Fabry-Perot-Type Antireflective Coating for Deep-Ultraviolet Binary Photomask Applications”, Applied Optics, vol. 41, No. 19, Jul. 1, 2002, pp. 3961-3965.
US2005/043549, Dec. 2006, PCT Search Report.
The Electrochemical Society, Inc.; H.L. Chen et al. ; “Fabry-Perot Type Antireflective Coatings for Binary Mask Applications in ArF and F5Excimer Laser Lithographies” (2003).
http://www.thinfilmproducts.umicore.com/evaportaion.asp “Evaporation Materials & Coating Materials for Vapor Deposition” (Mar. 3, 2006).
Micro)n Technology, Inc.
Rosasco Stephen
Wells St. John P.S.
LandOfFree
Reticles does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Reticles, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reticles will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4082204