Process for the deposition by CVD of a silver film on a...

Coating processes – Coating by vapor – gas – or smoke

Reexamination Certificate

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C427S250000, C427S255230, C427S255280

Reexamination Certificate

active

07608299

ABSTRACT:
The invention relates to the deposition of thin silver films on various substrates, particularly superconductor substrates. The method consists of CVD deposition of silver on a substrate with the aid of a silver precursor solution. The silver precursor is an RCO2Ag silver carboxylate, wherein R is a linear or branched radical having 3-7 carbon atoms, used in the form of an organic liquid solution. The precursor concentration of the solution ranges from 0.01 to 0.6 mol/l. The organic liquid comprises an amine and/or a nitrile and, optionally, a solvent whose evaporation temperature is lower than the decomposition temperature of the precursor. The percentage by volume of the amine and/or nitrile in the organic liquid is more than 0.1%.

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patent: 2002/0041928 (2002-04-01), Budaragin
patent: 2003/0116091 (2003-06-01), Grant et al.
N. Kuzmina et al, “Silver pivalate as a new volatile precursor for thin film deposition”, 1999, J. Phys. IV France, 9, 923-928.
International Search Report mailed Sep. 3, 2004.
Kuzmina et al., “Silver Pivalate as a New Volatile Precursor for Thin Film Deposition”, Journal De Physique IV, vol. 9, (1999), pp. 923-928.
Edwards et al., Aerosol-assisted Chemical Vapour Deposition (AACVD) of Silver Films from Triorganophosphine Adducts of Silver Carboxylates, Including the Structure of [Ag(O2CC3F7)(PPh3)2], Inorganica Chimica Acta, vol. 328, (2002) pp. 134-146.
Szlyk et al., “CVD of Ag1Complexes with Tertiary Phosphines and Perfluorinated Carboxylates —A New Class of Silver Precursors”, Chemical Vapor Deposition, vol. 7, No. 3, (2001), pp. 111-116.
Paramonov et al., “MOCVD of Ag Thin Films”, Journal De Physique IV: Proceedings, vol. 11, No. Pr3, (2001) pp. 645-652.
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