Film formation apparatus and film formation method

Details Film formation apparatus and film formation method Film formation apparatus and film formation method

2004-02-03

2009-12-08

Tran, Binh X (Department: 1792)

Coating processes

Coating by vapor, gas, or smoke

C427S249140, C427S255150, C427S255600

Reexamination Certificate

active

07629025

ABSTRACT:
There is provided a film formation apparatus for forming an organic compound film including a plurality of functional regions. A plurality of evaporation sources (203ato203c) are included in a film formation chamber (210), functional regions made of respective organic compounds are successively formed, and a mixed region can be further formed in an interface between the functional regions. Also, when means for applying energy to an organic compound molecule to be formed into a film in a molecular activation region (213) is provided in such a film formation chamber, a dense film can be formed.

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