Coating processes – Spraying
Reexamination Certificate
2006-02-14
2009-10-27
Meeks, Timothy H (Department: 1792)
Coating processes
Spraying
C198S691000, C198S860100, C198S860300, C361S001000, C361S042000, C193S037000, C118S072000, C118S073000, C427S058000, C427S096100, C427S123000, C427S162000, C427S164000, C427S165000, C427S427100, C427S428010
Reexamination Certificate
active
07608304
ABSTRACT:
A substrate carrying method for removing the electrical charges on a substrate and then carrying the substrate includes forming a conductive layer with conductivity on a part of the surface of the substrate, and carrying the substrate while supporting a conductive layer-forming region of the substrate by a grounded substrate supporting unit with conductivity.
REFERENCES:
patent: 3717791 (1973-02-01), Heyl et al.
patent: 4967259 (1990-10-01), Takagi
patent: 5776554 (1998-07-01), Merritt et al.
patent: 6981761 (2006-01-01), Usui et al.
patent: 7220922 (2007-05-01), Nishino et al.
patent: 2005/0064091 (2005-03-01), Yamazaki
patent: 2005/0106901 (2005-05-01), Chen
patent: 2005/0112906 (2005-05-01), Maekawa et al.
patent: 02-310531 (1990-12-01), None
patent: 06-250162 (1994-09-01), None
patent: 07-172572 (1995-07-01), None
patent: 10-133229 (1998-05-01), None
patent: 11-233599 (1999-08-01), None
patent: 2001-176946 (2001-06-01), None
patent: 2002-274642 (2002-09-01), None
patent: 2002274642 (2002-09-01), None
patent: 2003-332403 (2003-11-01), None
patent: WO2004/070821 (2004-08-01), None
Harness & Dickey & Pierce P.L.C.
Meeks Timothy H
Seiko Epson Corporation
Weddle Alexander
LandOfFree
Substrate carrying method and substrate carrying apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Substrate carrying method and substrate carrying apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate carrying method and substrate carrying apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4059854