Method of fabricating light-emitting device and...

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Compound semiconductor

Reexamination Certificate

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C257S096000

Reexamination Certificate

active

07553685

ABSTRACT:
A light-emitting device100has ITO transparent electrode layers8, 10used for applying drive voltage for light-emission to a light-emitting layer section24, and is designed so as to extract light from the light-emitting layer section24through the ITO transparent electrode layers8, 10. The light-emitting device100also has contact layers composed of In-containing GaAs, formed between the light-emitting layer section24and the ITO transparent electrode layers8, 10, so as to contact with the ITO transparent electrode layers respectively. The contact layers7, 9are formed by annealing a stack13obtained by forming GaAs layers7′, 9′on the light-emitting layer section, and by forming the ITO transparent electrode layers8, 10so as to contact with the GaAs layers7′, 9′,to thereby allow In to diffuse from the ITO transparent electrode layers8, 10into the GaAs layers7′, 9′.This provides a method of fabricating a light-emitting device, in which the ITO transparent electrode layers as the light-emission drive electrodes are bonded as being underlain by the contact layers, to thereby reduce contact resistance of these electrodes, and to thereby make the contact layers less susceptible to difference in the lattice constants with those of the light-emitting layer section during the formation thereof.

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